{"id":66340,"date":"2020-01-14T16:14:04","date_gmt":"2020-01-14T16:14:04","guid":{"rendered":"https:\/\/\/les-usa-veulent-empecher-la-chine-dacceder-a-la-lithographie-euv\/"},"modified":"2020-01-14T16:14:04","modified_gmt":"2020-01-14T16:14:04","slug":"les-usa-veulent-empecher-la-chine-dacceder-a-la-lithographie-euv","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/les-usa-veulent-empecher-la-chine-dacceder-a-la-lithographie-euv\/","title":{"rendered":"Les USA veulent emp\u00eacher la Chine d’acc\u00e9der \u00e0 la lithographie EUV"},"content":{"rendered":"

Il a \u00e9t\u00e9 rapport\u00e9 en novembre 2019 qu’ASML n’avait pas \u00e9t\u00e9 en mesure d’exp\u00e9dier une machine de lithographie EUV \u00e0 Semiconductor Manufacturing International Corp. (Shanghai, Chine) car une licence d’exportation \u00e0 double usage avait expir\u00e9 (voir <\/span> ASML delays Chinese delivery of EUV lithography tool<\/a> ).<\/span><\/p>\n

Le double usage fait r\u00e9f\u00e9rence \u00e0 la possibilit\u00e9 d’utiliser une technologie pour des applications commerciales et militaires. La privation de l’acc\u00e8s \u00e0 la fabrication de semiconducteurs en utilisant la lithographie EUV maintient de fait la capacit\u00e9 de fabrication de puces chinoise derri\u00e8re les technologies de pointe dans la fabrication de puces. EUVL est utilis\u00e9 pour la fabrication de puces \u00e0 une g\u00e9om\u00e9trie de moins de 10 nm. \u00c0 l’heure actuelle, les soci\u00e9t\u00e9s de puces chinoises et les entreprises telles que Huawei n’ont acc\u00e8s \u00e0 une technologie de pointe qu’en achetant des puces \u00e0 la fonderie TSMC \u00e0 Taiwan.<\/span><\/p>\n

Reuters a rapport\u00e9 que des responsables am\u00e9ricains jusque et y compris le secr\u00e9taire d’\u00c9tat Mike Pompeo ont fait pression sur le gouvernement n\u00e9erlandais de fin 2018 \u00e0 mi-2019 pour ne pas autoriser l’exportation d’un premier stepper de lithographie EUV, bien que l’octroi de la licence d’exportation soit de la comp\u00e9tence du gouvernement n\u00e9erlandais. .<\/span><\/p>\n

Ces exportations \u00e0 double usage sont couvertes par l’accord de Wassenaar qui, en 1996, a remplac\u00e9 le Comit\u00e9 de coordination pour le contr\u00f4le des exportations multilat\u00e9rales de l’\u00e8re de la guerre froide (COCOM). \u00c0 cette \u00e9poque, les \u00c9tats-Unis et l’Occident \u00e9taient tellement en avance sur l’URSS et la Chine que certaines restrictions ont pu \u00eatre lev\u00e9es.<\/span><\/p>\n

En vertu de l’accord de Wassenaaar, les \u00c9tats-Unis peuvent bloquer l’exportation d’\u00e9quipements dont les composants am\u00e9ricains repr\u00e9sentent plus de 25% du contenu. Le rapport Reuters indique que dans le cas des machines de lithographie ASML, ce n’est pas le cas.<\/span><\/p>\n

\u00e0 suivre<\/strong><\/em><\/p>\n

\n

Reuters a d\u00e9clar\u00e9 qu’en juillet 2019, le conseiller adjoint \u00e0 la s\u00e9curit\u00e9 nationale, Charles Kupperman, avait remis au Premier ministre n\u00e9erlandais Mark Rutte un rapport des services de renseignements sur les r\u00e9percussions potentielles de l’acc\u00e8s de la Chine \u00e0 la lithographie EUML.<\/span><\/p>\n

La licence d’exportation avait expir\u00e9 le 30 juin 2019 et aucune nouvelle licence n’a \u00e9t\u00e9 accord\u00e9e au cours des huit semaines suivantes au cours desquelles un renouvellement serait normalement accord\u00e9.<\/span>
\nLe rapport de Reuters ajoute que l’administration am\u00e9ricaine a d\u00e9clar\u00e9 qu’elle envisageait de r\u00e9duire l’exigence de pourcentage en vertu de Wassenaar pour certains types d’\u00e9quipements.<\/span><\/p>\n

Bien que l’outil de lithographie EUV puisse co\u00fbter jusqu’\u00e0 100 millions de dollars, ASML est un fournisseur en quasi monopole d’\u00e9quipements de lithographie et r\u00e9alise d’importantes ventes en Chine pour les g\u00e9n\u00e9rations pr\u00e9c\u00e9dentes d’\u00e9quipements.<\/span><\/p>\n

Le principal fournisseur chinois d’\u00e9quipements de fabrication de semiconducteurs est Advanced Micro-Fabrication Equipment Inc. Chine (AMEC) avec une expertise \u00e0 la fois dans le mat\u00e9riel de gravure et le MOCVD.<\/span><\/p>\n

Lire aussi:<\/p>\n

ASML victime de vol d’IP et non d’espionnage<\/a><\/p>\n

ASML victime de l’espionnage chinois<\/a>)<\/span><\/div>\n
\n

Fabrication de semiconducteurs : ASML ach\u00e8te Hermes Microvision <\/a><\/p>\n<\/div>\n

Related links and articles: <\/strong><\/p>\n

www.asml.com<\/a><\/p>\n

Reuters<\/em> report<\/a><\/p>\n

www.amec-inc.com<\/a><\/p>\n

Book review: ASML’s Architects<\/a><\/p>\n

News articles<\/strong>:<\/p>\n

ASML delays Chinese delivery of EUV lithography tool<\/a><\/p>\n

They were thieves not spies, says ASML <\/a><\/p>\n

ASML wins punitive damages in Chinese IP theft case <\/a><\/p>\n

ASML prospers as EUV lithography takes off <\/a><\/p>\n","protected":false},"excerpt":{"rendered":"

Le gouvernement am\u00e9ricain a fait pression pour que les Pays-Bas d\u00e9cident de ne pas renouveler une licence \u00ab\u00a0\u00e0 double usage\u00a0\u00bb pour exporter une technologie de lithographie ultraviolette extr\u00eame vers la Chine, selon un rapport de Reuters.<\/p>\n","protected":false},"author":22,"featured_media":66341,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[],"tags":[889,913,906,908],"domains":[47],"ppma_author":[1149],"class_list":["post-66340","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","tag-analog-fr","tag-materials-processes-fr","tag-mpus-mcus-fr","tag-plds-fpgas-asics-fr","domains-electronique-eci"],"acf":[],"yoast_head":"Les USA veulent emp\u00eacher la Chine d'acc\u00e9der \u00e0 la lithographi...<\/title>\n<meta name=\"description\" content=\"Le gouvernement am\u00e9ricain a fait pression pour que les 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