{"id":478255,"date":"2025-04-23T08:57:17","date_gmt":"2025-04-23T06:57:17","guid":{"rendered":"https:\/\/www.ecinews.fr\/?p=478255"},"modified":"2025-04-22T21:05:04","modified_gmt":"2025-04-22T19:05:04","slug":"la-lithographie-beuv-plus-performante-que-leuv","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/la-lithographie-beuv-plus-performante-que-leuv\/","title":{"rendered":"La lithographie BEUV plus performante que l’EUV ?"},"content":{"rendered":"

Lace Lithography AS (Bergen, Norv\u00e8ge) d\u00e9veloppe une forme de lithographie qui utilise des atomes tir\u00e9s sur une surface pour d\u00e9finir des caract\u00e9ristiques \u00e0 des r\u00e9solutions sup\u00e9rieures \u00e0 ce qui est possible avec la lithographie par ultraviolets extr\u00eames.<\/h2>\n

Ce que Lace Litho appelle BEUV permet th\u00e9oriquement d’obtenir des caract\u00e9ristiques plus fines, ce qui favorise la miniaturisation continue des transistors et prolonge la loi de Moore.<\/p>\n

L’entreprise a \u00e9t\u00e9 cofond\u00e9e en juillet 2023 par le PDG, le professeur Bodil Holst de l’universit\u00e9 de Bergen, et le directeur technique, Adria Salvador Palau, qui a obtenu son doctorat \u00e0 l’universit\u00e9 de Bergen, mais qui exerce aujourd’hui ses activit\u00e9s \u00e0 Barcelone, en Espagne.<\/p>\n

Les syst\u00e8mes EUV conventionnels utilisent une lumi\u00e8re d’une longueur d’onde de 13,5 nm pour cr\u00e9er des motifs sur les wafers \u00e0 l’aide d’une s\u00e9rie de miroirs et de masques. La lithographie atomique permet de cr\u00e9er directement des motifs sans masque \u00e0 des r\u00e9solutions inf\u00e9rieures \u00e0 ce qui est possible avec les syst\u00e8mes EUV \u00e0 longueur d’onde limit\u00e9e.<\/p>\n

\u00ab\u00a0En utilisant des atomes au lieu de la lumi\u00e8re, nous offrons aux fabricants de puces des capacit\u00e9s 15 ans en avance sur la technologie actuelle, d’une mani\u00e8re plus rentable et avec une empreinte \u00e9nerg\u00e9tique nettement plus faible\u00a0\u00bb, affirme l’entreprise sur son site web.<\/p>\n

Salvador Palau et le professeur Holst sont coauteurs d’un article publi\u00e9 dans Physics Review A<\/em>, intitul\u00e9 True-to-size surface mapping with neutral helium atoms (cartographie de surface \u00e0 taille r\u00e9elle avec des atomes d’h\u00e9lium neutres). <\/em>Cet article pr\u00e9sente les d\u00e9tails de la mise en \u0153uvre et du fonctionnement d’un microscope st\u00e9r\u00e9o \u00e0 h\u00e9lium.<\/p>\n

FabouLACE est un projet financ\u00e9 par l’Union europ\u00e9enne visant \u00e0 d\u00e9velopper la lithographie par atomes d’h\u00e9lium avec masque \u00e0 force de dispersion, avec un budget de 2,5 millions d’euros fourni par le Conseil europ\u00e9en de l’innovation. Le projet a d\u00e9marr\u00e9 le 1er d\u00e9cembre 2023 et se poursuivra jusqu’au 30 novembre 2026.<\/p>\n

FabouLACE utilise des atomes m\u00e9tastables et des masques bas\u00e9s sur la force de dispersion et permet d’obtenir des caract\u00e9ristiques de 2 nm. Lace Lithography est charg\u00e9e de commercialiser la technologie d’ici 2031, selon la Commission europ\u00e9enne. Entre-temps, les performances de la technologie seront contr\u00f4l\u00e9es et valid\u00e9es par l’institut de recherche IMEC en Belgique. NanoLACE \u00e9tait un projet de recherche europ\u00e9en ant\u00e9rieur qui a pris fin le 31 d\u00e9cembre 2024. Ce projet a d\u00e9but\u00e9 en 2019 et a re\u00e7u 3,36 millions d’euros sur un budget de 3,65 millions d’euros.<\/p>\n

Lace Lithography a lev\u00e9 un premier tour de table en juillet 2023 d’environ 450 000 euros, soutenu par Runa Capital, Vsquared Ventures, Future Ventures, le Conseil europ\u00e9en de l’innovation, Innovation Norway et le Conseil norv\u00e9gien de la recherche.<\/p>\n

Jusqu’\u00e0 pr\u00e9sent, l’entreprise a constitu\u00e9 une \u00e9quipe de plus de 20 physiciens, ing\u00e9nieurs et op\u00e9rateurs.<\/p>\n

Liens et articles connexes :<\/h4>\n

www.lacelithography.com<\/a><\/p>\n

FabouLACE<\/a><\/p>\n

NanoLACE<\/a><\/p>\n

Articles de presse :<\/h4>\n

La start-up Atlant 3D l\u00e8ve des fonds pour la fabrication de couches atomiques<\/a><\/p>\n

L’ALD de sp\u00e9cialit\u00e9 incite Applied Materials \u00e0 s’emparer de Picosun <\/a><\/p>\n

Picosun fournit un syst\u00e8me de d\u00e9p\u00f4t de couches atomiques pour PowderMEMS<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"

Lace Lithography AS (Bergen, Norv\u00e8ge) d\u00e9veloppe une forme de lithographie qui utilise des atomes tir\u00e9s sur une surface pour d\u00e9finir des caract\u00e9ristiques \u00e0 des r\u00e9solutions sup\u00e9rieures \u00e0 ce qui est possible avec la lithographie par ultraviolets extr\u00eames. Ce que Lace Litho appelle BEUV permet th\u00e9oriquement d’obtenir des caract\u00e9ristiques plus fines, ce qui favorise la miniaturisation […]<\/p>\n","protected":false},"author":40,"featured_media":478245,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[883],"tags":[9597,9596],"domains":[47],"ppma_author":[3631,6199],"class_list":["post-478255","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-technologies","tag-beuv","tag-lithographie-atomique","domains-electronique-eci"],"acf":[],"yoast_head":"La lithographie BEUV plus performante que l'EUV ? ...<\/title>\n<meta name=\"description\" content=\"Lace Lithography AS d\u00e9veloppe une forme de lithographie qui utilise des atomes tir\u00e9s sur une surface pour concurrencer la litho EUV\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, 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