{"id":466169,"date":"2024-11-22T12:14:06","date_gmt":"2024-11-22T11:14:06","guid":{"rendered":"https:\/\/www.ecinews.fr\/?p=466169"},"modified":"2024-11-22T12:14:06","modified_gmt":"2024-11-22T11:14:06","slug":"lithographie-euv-reduisant-la-consommation-de-10-x","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/","title":{"rendered":"Lithographie EUV r\u00e9duisant la consommation de 10 x"},"content":{"rendered":"<p>Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d&rsquo;\u00e9nergie d&rsquo;un syst\u00e8me de lithographie dans l&rsquo;ultraviolet extr\u00eame (EUV).<\/p>\n<p>Selon le professeur Tsumoru Shintake de l&rsquo;Institut des sciences et technologies d&rsquo;Okinawa (OIST), le projecteur \u00e0 deux miroirs dot\u00e9 d&rsquo;un syst\u00e8me d&rsquo;\u00e9clairage simplifi\u00e9 pourrait r\u00e9duire la consommation d&rsquo;\u00e9nergie d&rsquo;un facteur 10 par rapport au syst\u00e8me actuel de projecteur EUV \u00e0 six miroirs.<\/p>\n<ul>\n<li><a href=\"https:\/\/www.eenewseurope.com\/en\/power-is-next-challenge-for-euv-lithography\/\">La puissance est le prochain d\u00e9fi de la lithographie EUV<\/a><\/li>\n<li><a href=\"https:\/\/www.eenewseurope.com\/en\/us-funds-1bn-centre-to-take-on-asml-in-euv-lithography\/\">Les \u00c9tats-Unis financent un centre de lithographie EUV \u00e0 hauteur d&rsquo;un milliard de dollars<\/a><\/li>\n<li><a href=\"https:\/\/www.eenewseurope.com\/en\/intel-fellow-discusses-high-na-euv-lithography-progress\/\">Un chercheur d&rsquo;Intel discute de la lithographie EUV \u00e0 haute NA<\/a><\/li>\n<\/ul>\n<p>La puissance est consid\u00e9r\u00e9e comme le prochain d\u00e9fi majeur pour les syst\u00e8mes EUV. Cette architecture n\u00e9cessite une puissance d&rsquo;\u00e9clairage EUV de 20 W pour une vitesse de traitement de 100 plaquettes par heure, ce qui r\u00e9duit la consommation \u00e9lectrique totale du syst\u00e8me \u00e0 moins de 100 kW. Ce chiffre est \u00e0 comparer aux technologies conventionnelles qui n\u00e9cessitent souvent plus de 1 MW (1 000 kW) pour fonctionner.<\/p>\n<p>\u00ab\u00a0Cette configuration est d&rsquo;une simplicit\u00e9 inimaginable, \u00e9tant donn\u00e9 que les projecteurs conventionnels n\u00e9cessitent au moins six miroirs r\u00e9fl\u00e9chissants. Elle a \u00e9t\u00e9 rendue possible en repensant soigneusement la th\u00e9orie de la correction de l&rsquo;aberration en optique\u00a0\u00bb, a d\u00e9clar\u00e9 le professeur Shintake. \u00ab\u00a0Les performances ont \u00e9t\u00e9 v\u00e9rifi\u00e9es \u00e0 l&rsquo;aide du logiciel de simulation optique OpTaliX et il est garanti qu&rsquo;elles sont suffisantes pour la production de semi-conducteurs avanc\u00e9s.\u00a0\u00bb<\/p>\n<p>L&rsquo;architecture prend en charge une ouverture num\u00e9rique (NA) de 0,2 avec un champ de 20 mm et une NA de 0,3 avec un champ de 10 mm, au lieu de la NA de 0,55 utilis\u00e9e pour les syst\u00e8mes \u00e0 haute NA de pointe. Cela permet d&rsquo;assembler le projecteur EUV dans une configuration de tube cylindrique similaire \u00e0 celle d&rsquo;un projecteur DUV, ce qui offre une stabilit\u00e9 m\u00e9canique sup\u00e9rieure et facilite l&rsquo;assemblage et la maintenance.<\/p>\n<p>La lumi\u00e8re EUV est introduite devant le masque par deux miroirs cylindriques \u00e9troits situ\u00e9s de part et d&rsquo;autre du c\u00f4ne de diffraction, fournissant un \u00e9clairage normal moyen et r\u00e9duisant l&rsquo;effet 3D du masque.<\/p>\n<p>La seconde concerne une nouvelle m\u00e9thode pour diriger efficacement la lumi\u00e8re EUV sur les motifs logiques d&rsquo;un miroir plat (le photomasque) sans bloquer le chemin optique. La limite th\u00e9orique de r\u00e9solution est de 24 nm avec un champ de 20 mm et un masque \u00e0 surface courbe, la hauteur de l&rsquo;outil peut \u00eatre r\u00e9duite \u00e0 (OID) 1500 mm, ce qui permet d&rsquo;obtenir une r\u00e9solution de 16 nm. Cela permet de concevoir des puces de 7 nm et moins.<\/p>\n<p>L&rsquo;architecture de lithographie EUV est brevet\u00e9e par l&rsquo;OIST et conviendra \u00e0 la production de puces de petite taille pour les applications mobiles ainsi qu&rsquo;\u00e0 la derni\u00e8re technologie de chiplet, selon M. Shintake.<\/p>\n<p><a href=\"http:\/\/www.oist.jp\">www.oist.jp<\/a><\/p>\n<p>&nbsp;<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d&rsquo;\u00e9nergie d&rsquo;un syst\u00e8me de lithographie dans l&rsquo;ultraviolet extr\u00eame (EUV). Selon le professeur Tsumoru Shintake de l&rsquo;Institut des sciences et technologies d&rsquo;Okinawa (OIST), le projecteur \u00e0 deux miroirs dot\u00e9 d&rsquo;un syst\u00e8me d&rsquo;\u00e9clairage simplifi\u00e9 pourrait r\u00e9duire la consommation d&rsquo;\u00e9nergie d&rsquo;un facteur 10 par [&hellip;]<\/p>\n","protected":false},"author":40,"featured_media":466133,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[3669,883],"tags":[8015],"domains":[47],"ppma_author":[3640,6199],"class_list":["post-466169","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-nouvelles","category-technologies","tag-lithographie-euv","domains-electronique-eci"],"acf":[],"yoast_head":"<title>Lithographie EUV r\u00e9duisant la consommation de 10 x ...<\/title>\n<meta name=\"description\" content=\"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d&#039;\u00e9nergie de la lithographie EUV.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Lithographie EUV r\u00e9duisant la consommation de 10 x\" \/>\n<meta property=\"og:description\" content=\"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d&#039;\u00e9nergie de la lithographie EUV.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169\/\" \/>\n<meta property=\"og:site_name\" content=\"EENewsEurope\" \/>\n<meta property=\"article:published_time\" content=\"2024-11-22T11:14:06+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2024\/11\/euv_comparison-scaled.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"1080\" \/>\n\t<meta property=\"og:image:height\" content=\"676\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Nick Flaherty, A Delapalisse\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"A Delapalisse\" \/>\n\t<meta name=\"twitter:label2\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"2 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#article\",\"isPartOf\":{\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/\"},\"author\":{\"name\":\"A Delapalisse\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/4b3db5ba5c953c5fddeb226df86d8635\"},\"headline\":\"Lithographie EUV r\u00e9duisant la consommation de 10 x\",\"datePublished\":\"2024-11-22T11:14:06+00:00\",\"dateModified\":\"2024-11-22T11:14:06+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/\"},\"wordCount\":501,\"publisher\":{\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#organization\"},\"keywords\":[\"Lithographie EUV\"],\"articleSection\":[\"Nouvelles\",\"Technologies\"],\"inLanguage\":\"fr-FR\"},{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/\",\"url\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/\",\"name\":\"Lithographie EUV r\u00e9duisant la consommation de 10 x -\",\"isPartOf\":{\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#website\"},\"datePublished\":\"2024-11-22T11:14:06+00:00\",\"dateModified\":\"2024-11-22T11:14:06+00:00\",\"description\":\"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d'\u00e9nergie de la lithographie EUV.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#breadcrumb\"},\"inLanguage\":\"fr-FR\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.ecinews.fr\/fr\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Lithographie EUV r\u00e9duisant la consommation de 10 x\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#website\",\"url\":\"https:\/\/www.eenewseurope.com\/en\/\",\"name\":\"EENewsEurope\",\"description\":\"Just another WordPress site\",\"publisher\":{\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.eenewseurope.com\/en\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"fr-FR\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#organization\",\"name\":\"EENewsEurope\",\"url\":\"https:\/\/www.eenewseurope.com\/en\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"fr-FR\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#\/schema\/logo\/image\/\",\"url\":\"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2022\/02\/logo-1.jpg\",\"contentUrl\":\"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2022\/02\/logo-1.jpg\",\"width\":283,\"height\":113,\"caption\":\"EENewsEurope\"},\"image\":{\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#\/schema\/logo\/image\/\"}},{\"@type\":\"Person\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/4b3db5ba5c953c5fddeb226df86d8635\",\"name\":\"A Delapalisse\",\"image\":{\"@type\":\"ImageObject\",\"inLanguage\":\"fr-FR\",\"@id\":\"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/image\/09af0e1236b95ff53924b8dfe5af278e\",\"url\":\"https:\/\/secure.gravatar.com\/avatar\/010f811c0933b47aea7e9204117b17c6?s=96&d=mm&r=g\",\"contentUrl\":\"https:\/\/secure.gravatar.com\/avatar\/010f811c0933b47aea7e9204117b17c6?s=96&d=mm&r=g\",\"caption\":\"A Delapalisse\"}}]}<\/script>","yoast_head_json":{"title":"Lithographie EUV r\u00e9duisant la consommation de 10 x ...","description":"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d'\u00e9nergie de la lithographie EUV.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169\/","og_locale":"fr_FR","og_type":"article","og_title":"Lithographie EUV r\u00e9duisant la consommation de 10 x","og_description":"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d'\u00e9nergie de la lithographie EUV.","og_url":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169\/","og_site_name":"EENewsEurope","article_published_time":"2024-11-22T11:14:06+00:00","og_image":[{"width":1080,"height":676,"url":"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2024\/11\/euv_comparison-scaled.jpg","type":"image\/jpeg"}],"author":"Nick Flaherty, A Delapalisse","twitter_card":"summary_large_image","twitter_misc":{"Written by":"A Delapalisse","Est. reading time":"2 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"Article","@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#article","isPartOf":{"@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/"},"author":{"name":"A Delapalisse","@id":"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/4b3db5ba5c953c5fddeb226df86d8635"},"headline":"Lithographie EUV r\u00e9duisant la consommation de 10 x","datePublished":"2024-11-22T11:14:06+00:00","dateModified":"2024-11-22T11:14:06+00:00","mainEntityOfPage":{"@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/"},"wordCount":501,"publisher":{"@id":"https:\/\/www.eenewseurope.com\/en\/#organization"},"keywords":["Lithographie EUV"],"articleSection":["Nouvelles","Technologies"],"inLanguage":"fr-FR"},{"@type":"WebPage","@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/","url":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/","name":"Lithographie EUV r\u00e9duisant la consommation de 10 x -","isPartOf":{"@id":"https:\/\/www.eenewseurope.com\/en\/#website"},"datePublished":"2024-11-22T11:14:06+00:00","dateModified":"2024-11-22T11:14:06+00:00","description":"Un chercheur japonais propose une architecture qui r\u00e9duit consid\u00e9rablement la complexit\u00e9 et la consommation d'\u00e9nergie de la lithographie EUV.","breadcrumb":{"@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#breadcrumb"},"inLanguage":"fr-FR","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/"]}]},{"@type":"BreadcrumbList","@id":"https:\/\/www.ecinews.fr\/fr\/lithographie-euv-reduisant-la-consommation-de-10-x\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.ecinews.fr\/fr\/"},{"@type":"ListItem","position":2,"name":"Lithographie EUV r\u00e9duisant la consommation de 10 x"}]},{"@type":"WebSite","@id":"https:\/\/www.eenewseurope.com\/en\/#website","url":"https:\/\/www.eenewseurope.com\/en\/","name":"EENewsEurope","description":"Just another WordPress site","publisher":{"@id":"https:\/\/www.eenewseurope.com\/en\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.eenewseurope.com\/en\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"fr-FR"},{"@type":"Organization","@id":"https:\/\/www.eenewseurope.com\/en\/#organization","name":"EENewsEurope","url":"https:\/\/www.eenewseurope.com\/en\/","logo":{"@type":"ImageObject","inLanguage":"fr-FR","@id":"https:\/\/www.eenewseurope.com\/en\/#\/schema\/logo\/image\/","url":"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2022\/02\/logo-1.jpg","contentUrl":"https:\/\/www.ecinews.fr\/wp-content\/uploads\/2022\/02\/logo-1.jpg","width":283,"height":113,"caption":"EENewsEurope"},"image":{"@id":"https:\/\/www.eenewseurope.com\/en\/#\/schema\/logo\/image\/"}},{"@type":"Person","@id":"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/4b3db5ba5c953c5fddeb226df86d8635","name":"A Delapalisse","image":{"@type":"ImageObject","inLanguage":"fr-FR","@id":"https:\/\/www.eenewseurope.com\/en\/#\/schema\/person\/image\/09af0e1236b95ff53924b8dfe5af278e","url":"https:\/\/secure.gravatar.com\/avatar\/010f811c0933b47aea7e9204117b17c6?s=96&d=mm&r=g","contentUrl":"https:\/\/secure.gravatar.com\/avatar\/010f811c0933b47aea7e9204117b17c6?s=96&d=mm&r=g","caption":"A Delapalisse"}}]}},"authors":[{"term_id":3640,"user_id":0,"is_guest":1,"slug":"nick-flaherty","display_name":"Nick Flaherty","avatar_url":"https:\/\/secure.gravatar.com\/avatar\/?s=96&d=mm&r=g","0":null,"1":"","2":"","3":"","4":"","5":"","6":"","7":"","8":""},{"term_id":6199,"user_id":40,"is_guest":0,"slug":"andre-rousselotemisys-com","display_name":"A Delapalisse","avatar_url":"https:\/\/secure.gravatar.com\/avatar\/010f811c0933b47aea7e9204117b17c6?s=96&d=mm&r=g","0":null,"1":"","2":"","3":"","4":"","5":"","6":"","7":"","8":""}],"_links":{"self":[{"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169"}],"collection":[{"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/users\/40"}],"replies":[{"embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/comments?post=466169"}],"version-history":[{"count":0,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/466169\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/media\/466133"}],"wp:attachment":[{"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/media?parent=466169"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/categories?post=466169"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/tags?post=466169"},{"taxonomy":"domains","embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/domains?post=466169"},{"taxonomy":"author","embeddable":true,"href":"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/ppma_author?post=466169"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}