{"id":462172,"date":"2024-10-07T15:16:38","date_gmt":"2024-10-07T13:16:38","guid":{"rendered":"https:\/\/www.ecinews.fr\/?p=462172"},"modified":"2024-10-07T15:18:39","modified_gmt":"2024-10-07T13:18:39","slug":"canon-livre-une-machine-de-lithographie-par-nano-impression-de-classe-5nm","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/canon-livre-une-machine-de-lithographie-par-nano-impression-de-classe-5nm\/","title":{"rendered":"Canon livre une machine de lithographie par nano-impression de classe 5nm"},"content":{"rendered":"<h2>La soci\u00e9t\u00e9 japonaise Canon Inc. a livr\u00e9 une plate-forme de lithographie par nano-impression pour la fabrication de semi-conducteurs &#8211; la FPA1200NZ2C &#8211; \u00e0 l&rsquo;Institut d&rsquo;\u00e9lectronique du Texas, conform\u00e9ment aux pr\u00e9visions de livraison pour 2024.<\/h2>\n<p>Canon est un producteur de masse de machines de lithographie optique KrF et i-line, mais la lithographie par nano-impression (NIL) est plus largement applicable et constitue une alternative potentielle \u00e0 la lithographie de pointe dans l&rsquo;ultraviolet extr\u00eame (EUV), \u00e0 un co\u00fbt bien moindre.<\/p>\n<p>Un syst\u00e8me NIL d\u00e9finit les puces en estampant des motifs de r\u00e9sine photosensible. Le syst\u00e8me NIL FPA-1200NZ2C de Canon pour les wafers de 300 mm permet de cr\u00e9er des motifs avec une largeur de ligne minimale de 14 nm, ce qui \u00e9quivaut approximativement au n\u0153ud de fabrication de 5 nm. Selon Canon, l&rsquo;am\u00e9lioration de la technologie des masques permettra \u00e0 la technologie NIL d&rsquo;atteindre une largeur de ligne minimale de 10 nm, ce qui correspond au n\u0153ud de 2 nm.<\/p>\n<blockquote class=\"wp-embedded-content\" data-secret=\"SSkFQxNaQo\"><p><a href=\"https:\/\/www.eenewseurope.com\/en\/canon-could-ship-nano-imprint-lithography-machines-in-2024\/\">Canon could ship nano-imprint lithography machines in 2024<\/a><\/p><\/blockquote>\n<p><iframe class=\"wp-embedded-content lazyload\" sandbox=\"allow-scripts\" security=\"restricted\" style=\"position: absolute; visibility: hidden;\" title=\"&#8220;Canon could ship nano-imprint lithography machines in 2024&#8221; &#8212; eeNews Europe\" data-src=\"https:\/\/www.eenewseurope.com\/en\/canon-could-ship-nano-imprint-lithography-machines-in-2024\/embed\/#?secret=RsqVusdyf8#?secret=SSkFQxNaQo\" data-secret=\"SSkFQxNaQo\" width=\"500\" height=\"282\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" src=\"data:image\/svg+xml;base64,PHN2ZyB3aWR0aD0iMSIgaGVpZ2h0PSIxIiB4bWxucz0iaHR0cDovL3d3dy53My5vcmcvMjAwMC9zdmciPjwvc3ZnPg==\" data-load-mode=\"1\"><\/iframe><\/p>\n<p>Comme le processus de transfert des sch\u00e9mas de circuit de la NIL ne passe pas par un m\u00e9canisme optique, les sch\u00e9mas de circuit fins sur le masque peuvent \u00eatre reproduits fid\u00e8lement sur la plaquette de silicium, ce qui \u00e9vite d&rsquo;avoir recours \u00e0 la correction optique des sch\u00e9mas (OPC), un processus complexe et gourmand en ressources informatiques qui est de plus en plus abord\u00e9 par les techniques d&rsquo;intelligence artificielle.<\/p>\n<p>Ce FPA-1200NZ2C sera utilis\u00e9 au Texas Institute for Electronics pour la recherche et le d\u00e9veloppement de semi-conducteurs avanc\u00e9s et la production de prototypes, a d\u00e9clar\u00e9 Canon.<\/p>\n<p>Le Texas Institute for Electronics est un consortium de semi-conducteurs fond\u00e9 en 2021 et soutenu par l&rsquo;universit\u00e9 du Texas \u00e0 Austin. Il se compose de gouvernements locaux et d&rsquo;\u00c9tats, d&rsquo;entreprises de semi-conducteurs, d&rsquo;instituts de recherche nationaux et d&rsquo;autres entit\u00e9s. Il offre un acc\u00e8s libre aux initiatives de recherche et d\u00e9veloppement sur les semi-conducteurs et aux installations de prototypage afin d&rsquo;aider \u00e0 r\u00e9soudre les probl\u00e8mes li\u00e9s \u00e0 la technologie avanc\u00e9e des semi-conducteurs, y compris la technologie de packaging avanc\u00e9e.<\/p>\n<h4>Liens et articles connexes :<\/h4>\n<p><a href=\"https:\/\/www.canon.com\">www.canon.com<\/a><\/p>\n<h4>Articles de presse :<\/h4>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/canon-looks-to-nanoimprint-tech-for-2nm-lithography\/\">Canon mise sur la technique de la nano-impression pour la lithographie \u00e0 2 nm <\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/canon-prepares-to-ramp-nano-imprint-lithography\/\">Canon se pr\u00e9pare \u00e0 lancer la lithographie par nano-impression<\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/deal-creates-first-nanoimprint-lithography-system-with-inkjet-coating\/\">Deal cr\u00e9e le premier syst\u00e8me de lithographie par nanoimpression avec impression \u00e0 jet d&rsquo;encre <\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/intel-spins-out-4-3bn-chip-mask-making-business-in-europe\/\">Intel externalise son activit\u00e9 de fabrication de masques pour puces pour un montant de 4,3 milliards de dollars<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>La soci\u00e9t\u00e9 japonaise Canon Inc. a livr\u00e9 une plate-forme de lithographie par nano-impression pour la fabrication de semi-conducteurs &#8211; la FPA1200NZ2C &#8211; \u00e0 l&rsquo;Institut d&rsquo;\u00e9lectronique du Texas, conform\u00e9ment aux pr\u00e9visions de livraison pour 2024. Canon est un producteur de masse de machines de lithographie optique KrF et i-line, mais la lithographie par nano-impression (NIL) est [&hellip;]<\/p>\n","protected":false},"author":40,"featured_media":462156,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[883],"tags":[5732,2427],"domains":[47],"ppma_author":[3631,6199],"class_list":["post-462172","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-technologies","tag-lithographie-par-nano-impression","tag-nil","domains-electronique-eci"],"acf":[],"yoast_head":"<title>Canon livre une machine litho par nano-impression de classe 5nm ...<\/title>\n<meta name=\"description\" content=\"Canon Inc. a livr\u00e9 une plate-forme de lithographie par nano-impression pour la fabrication de semi-conducteurs au Texas.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, 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