{"id":442602,"date":"2024-01-31T12:17:48","date_gmt":"2024-01-31T11:17:48","guid":{"rendered":"https:\/\/www.eenewseurope.com\/?p=442602"},"modified":"2024-01-31T12:19:53","modified_gmt":"2024-01-31T11:19:53","slug":"canon-offre-la-lithographie-par-nano-impression-10x-moins-cher-que-leuv","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/canon-offre-la-lithographie-par-nano-impression-10x-moins-cher-que-leuv\/","title":{"rendered":"Canon offre la lithographie par nano-impression 10x moins cher que l&rsquo;EUV"},"content":{"rendered":"<h2>Canon Inc. esp\u00e8re commencer \u00e0 livrer des machines de lithographie par nano-impression en 2024 ou au d\u00e9but de 2025 et faire concurrence \u00e0 ASML Holding NV avec des outils permettant de fabriquer des semiconducteurs de pointe.<\/h2>\n<p>\u00ab\u00a0Nous aimerions commencer \u00e0 exp\u00e9dier cette ann\u00e9e ou l&rsquo;ann\u00e9e prochaine..Nous voulons le faire pendant que le march\u00e9 est chaud\u00a0\u00bb, a d\u00e9clar\u00e9 Hiroaki Takeishi, directeur du groupe industriel de Canon, cit\u00e9 par le <em>Financial Times<\/em>.<\/p>\n<p>Canon est d\u00e9j\u00e0 un producteur de masse de machines de lithographie optique KrF et i-line, mais la lithographie par nano-impression (NIL) permet de fabriquer des puces en estampant des motifs de r\u00e9sine photosensible.<\/p>\n<p>Le syst\u00e8me NIL FPA-1200NZ2C de Canon pour les wafers de 300 mm permet de cr\u00e9er des motifs avec une largeur de ligne minimale de 14 nm, ce qui \u00e9quivaut au n\u0153ud de fabrication de 5 nm requis pour produire la plupart des semiconducteurs logiques avanc\u00e9s. Selon Canon, l&rsquo;am\u00e9lioration de la technologie des masques permettra \u00e0 la technologie NIL d&rsquo;atteindre une largeur de ligne minimale de 10 nm, ce qui correspond au n\u0153ud de 2 nm.<\/p>\n<p>Le syst\u00e8me est beaucoup plus simple et moins co\u00fbteux que les machines de lithographie dans l&rsquo;ultraviolet extr\u00eame\u00a0 EUV d&rsquo;ASML, qui peuvent co\u00fbter plus de 150 millions de dollars chacune. M. Takeishi a d\u00e9clar\u00e9 au <em>Financial Times<\/em> que les machines Canon NIL seraient d&rsquo;un ordre de grandeur inf\u00e9rieur aux machines EUVL et ne consommeraient que 10 % de l&rsquo;\u00e9nergie.<\/p>\n<p>Il aura fallu attendre 20 ans pour qu&rsquo;elle se concr\u00e9tise. Canon a commenc\u00e9 \u00e0 faire des recherches sur le sujet en 2004. \u00c0 partir de 2009, Canon a men\u00e9 un d\u00e9veloppement conjoint avec la start-up am\u00e9ricaine Molecular Imprints Inc. avant d&rsquo;acqu\u00e9rir la soci\u00e9t\u00e9 en 2014.<\/p>\n<p>Le degr\u00e9 de pr\u00e9cision de cette technologie et sa capacit\u00e9 \u00e0 concurrencer l&rsquo;EUVL restent incertains.<\/p>\n<p>Les premi\u00e8res livraisons concerneront des machines de test. Les clients de Canon seront encourag\u00e9s \u00e0 \u00e9valuer si l&rsquo;effort d&rsquo;int\u00e9gration des machines NIL dans les flux de processus en vaut la peine.<\/p>\n<p>Le temps de recherche consid\u00e9rable consacr\u00e9 \u00e0 l&rsquo;am\u00e9lioration de l&rsquo;EUVL, \u00e0 sa caract\u00e9risation et \u00e0 l&rsquo;acc\u00e9l\u00e9ration de la production de wafers de silicium conf\u00e8re \u00e0 l&rsquo;EUVL un avantage de titulaire, du moins pour la production de logique de pointe. La NIL offre des possibilit\u00e9s de caract\u00e9risation de nouvelles technologies \u00e0 la pointe de la miniaturisation, telles que les m\u00e9moires flash 3D-NAND, la photonique, les r\u00e9seaux laser, les interposeurs en silicium, les MEMS et les dispositifs d&rsquo;alimentation.<\/p>\n<p>Cependant, son application potentielle \u00e0 la pointe de la technologie et l&rsquo;origine d&rsquo;au moins une partie de sa technologie aux \u00c9tats-Unis signifient qu&rsquo;elle est susceptible de tomber sous le coup des m\u00eames contr\u00f4les \u00e0 l&rsquo;exportation que la lithographie EUV, emp\u00eachant ainsi les ventes en Chine.<\/p>\n<h4>Liens et articles connexes :<\/h4>\n<p><a href=\"http:\/\/www.canon.com\">www.canon.com<\/a><\/p>\n<h4>Articles de presse :<\/h4>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/canon-looks-to-nanoimprint-tech-for-2nm-lithography\/\">Canon mise sur la technique de la nano-impression pour la lithographie \u00e0 2 nm <\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/canon-prepares-to-ramp-nano-imprint-lithography\/\">Canon se pr\u00e9pare \u00e0 lancer la lithographie par nano-impression<\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/deal-creates-first-nanoimprint-lithography-system-with-inkjet-coating\/\">Deal cr\u00e9e le premier syst\u00e8me de lithographie par nanoimpression avec impression \u00e0 jet d&rsquo;encre <\/a><\/p>\n<p><a href=\"https:\/\/www.eenewseurope.com\/en\/intel-spins-out-4-3bn-chip-mask-making-business-in-europe\/\">Intel externalise son activit\u00e9 de fabrication de masques pour puces pour un montant de 4,3 milliards de dollars<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Canon Inc. esp\u00e8re commencer \u00e0 livrer des machines de lithographie par nano-impression en 2024 ou au d\u00e9but de 2025 et faire concurrence \u00e0 ASML Holding NV avec des outils permettant de fabriquer des semiconducteurs de pointe. \u00ab\u00a0Nous aimerions commencer \u00e0 exp\u00e9dier cette ann\u00e9e ou l&rsquo;ann\u00e9e prochaine..Nous voulons le faire pendant que le march\u00e9 est chaud\u00a0\u00bb, [&hellip;]<\/p>\n","protected":false},"author":34,"featured_media":408326,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[880],"tags":[2933,5733,3104,4265],"domains":[47],"ppma_author":[3631,1153],"class_list":["post-442602","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-actualites-economiques","tag-asml","tag-canon","tag-lithographie","tag-preuve-de-concept","domains-electronique-eci"],"acf":[],"yoast_head":"<title>Canon pourrait livrer des machines de lithographie par nano-imp...<\/title>\n<meta name=\"description\" content=\"Canon va livrer des machines de lithographie par nano-impression en 2024 et faire concurrence \u00e0 ASML pour les semiconducteurs de pointe.\" \/>\n<meta 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