{"id":408621,"date":"2022-12-14T21:15:32","date_gmt":"2022-12-14T20:15:32","guid":{"rendered":"https:\/\/www.eenewseurope.com\/?p=408621"},"modified":"2022-12-15T10:52:31","modified_gmt":"2022-12-15T09:52:31","slug":"canon-en-voie-dindustrialiser-la-lithographie-nano-imprint-nil-concurrent-de-euv","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/canon-en-voie-dindustrialiser-la-lithographie-nano-imprint-nil-concurrent-de-euv\/","title":{"rendered":"Canon en voie d’industrialiser la lithographie nano-imprint NIL"},"content":{"rendered":"

Apr\u00e8s huit ans de R&D et de ventes limit\u00e9es, Canon se pr\u00e9pare \u00e0 acc\u00e9l\u00e9rer la production d’\u00e9quipements de fabrication de puces de lithographie par nanoimpression pour le march\u00e9 de la production de semiconducteurs.<\/span><\/span> <\/span><\/h2>\n

Canon construit une usine \u00e0 Utsunomiya, dans la pr\u00e9fecture de Tochigi au nord de Tokyo, pour un co\u00fbt estim\u00e9 \u00e0 50 milliards de yens (environ 366 millions de dollars).<\/span><\/span> L’usine sera utilis\u00e9e pour fabriquer des machines de lithographie KrF et i-line mais aussi pour augmenter la production de machines de lithographie par nano-impression (NIL).<\/span><\/span> Les op\u00e9rations devraient commencer en 2025.<\/span><\/span> <\/span><\/p>\n

La lithographie KrF et i-line sont des techniques matures, mais elles sont encore utilis\u00e9es pour de nombreux types de circuits int\u00e9gr\u00e9s, MEMS et \u00e9crans plats.<\/span><\/span> La lithographie NIL peut \u00e9galement \u00eatre utilis\u00e9 \u00e0 ces g\u00e9om\u00e9tries plus larges, mais a la possibilit\u00e9 de d\u00e9finir des dimensions de structure beaucoup plus fines \u00e0 10 nm et moins.<\/span><\/span><\/span><\/p>\n

Dans une pr\u00e9sentation destin\u00e9e aux analystes accompagnant les r\u00e9sultats financiers de Canon au 3T22, Fujio Mitarai, pr\u00e9sident et CEO, a d\u00e9clar\u00e9 que la soci\u00e9t\u00e9 en \u00e9tait \u00e0 la derni\u00e8re \u00e9tape d’ajustement pour l’utilisation de NIL dans la production de masse.<\/span><\/span> Mitarai a d\u00e9clar\u00e9 que Canon travaillait avec la New Energy and Industrial Technology Development Organization (NEDO), une agence nationale de R&D, depuis mars 2021, lorsque la technologie NIL avait \u00e9t\u00e9 s\u00e9lectionn\u00e9e comme projet de R&D.<\/span><\/span><\/span><\/p>\n

Les \u00e9quipements de lithographie en p\u00e9nurie jusqu\u2019en 2023 selon ASML<\/a><\/p>\n

Canon s’est engag\u00e9 dans la technologie NIL gr\u00e2ce \u00e0 l’acquisition de Molecular Imprints Inc. (Austin, Texas) en 2014, qu’il a renomm\u00e9 Canon Nanotechnologies Inc. La soci\u00e9t\u00e9 affirme que sa version de la technologie peut nano-imprimer des structures jusqu’\u00e0 10 nm et moins \u00e0 tr\u00e8s faible co\u00fbt.<\/span><\/span> Cela pourrait faire de la technologie une alternative \u00e0 la lithographie extr\u00eame ultraviolette (EUV) tr\u00e8s co\u00fbteuse utilis\u00e9e par TSMC, Samsung et autres.<\/span><\/span> Molecular Imprints Inc. <\/span><\/span>a \u00e9t\u00e9 fond\u00e9e en 2001.<\/span><\/span><\/span><\/p>\n

Une aubaine pour la Chine ?<\/h4>\n

Les origines de la technologie NIL de Canon aux \u00c9tats-Unis signifient qu’elle est probablement soumise aux m\u00eames contr\u00f4les \u00e0 l’exportation que la lithographie EUV d’ASML Holding NV, emp\u00eachant les ventes en Chine.<\/span><\/span> <\/span><\/p>\n

Les USA veulent emp\u00eacher la Chine d\u2019acc\u00e9der \u00e0 la lithographie EUV<\/a><\/p>\n

Les vastes quantit\u00e9s de temps de recherche consacr\u00e9es \u00e0 l’am\u00e9lioration de l’EUV, \u00e0 sa caract\u00e9risation et \u00e0 l’acc\u00e9l\u00e9ration du d\u00e9bit des wafers conf\u00e8rent \u00e0 l’EUV l’avantage du prelier sur le march\u00e9, au moins pour la production logique de pointe.<\/span><\/span> NIL a des opportunit\u00e9s dans la caract\u00e9risation de nouvelles technologies \u00e0 la pointe de la miniaturisation – telles que la photonique, les r\u00e9seaux laser, les interposeurs de silicium, les MEMS et les composants de puissance.<\/span><\/span><\/span><\/p>\n

 <\/p>\n

Canon n’a pas mentionn\u00e9 de fabricants de puces particuliers qui ach\u00e8teraient des machines NIL.<\/span><\/span> Cependant, NIL pourrait \u00eatre mieux adapt\u00e9 \u00e0 la d\u00e9finition de circuits int\u00e9gr\u00e9s avec un degr\u00e9 \u00e9lev\u00e9 de r\u00e9p\u00e9tition, tels que des m\u00e9moires DRAM, flash NAND et flash 3D-NAND.<\/span><\/span> Canon a install\u00e9 une machine NIL dans le complexe de fabrication de Yokkaichi de Kioxia.<\/span><\/span> <\/span><\/p>\n

Parmi les autres producteurs d’\u00e9quipements de lithographie nanotechnologique figurent EV Group, SUSS MicroTec et Obducat AB.<\/span><\/span><\/span><\/p>\n

 <\/p>\n

Related links and articles:<\/h4>\n

www.canon.com<\/a><\/p>\n

cnt.canon.com<\/a><\/p>\n

www.evg.com<\/a><\/p>\n

www.suss.com<\/a><\/p>\n

www.obducat.com<\/a><\/p>\n

News articles:<\/h4>\n

EVG, Toppan team for nanoimprint photonics lithography<\/a><\/p>\n

Mastering service cuts nanoimprint litho costs<\/a><\/p>\n

Nanoimprint lithography at full 300mm scale<\/a><\/p>\n

Nanoimprint lithography runs at at full scale on 300mm wafers<\/a><\/p>\n

Nanoimprint lithography adopted for DFB lasers<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"

Canon en voie d’industrialiser la lithographie nano-imprint NIL concurrent de EUV et capable de g\u00e9om\u00e9tries en dessous de 10 nm<\/p>\n","protected":false},"author":34,"featured_media":408325,"comment_status":"closed","ping_status":"closed","sticky":true,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[883],"tags":[2427,1558,2421],"domains":[47],"ppma_author":[1153,1136],"class_list":["post-408621","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-technologies","tag-nil","tag-semiconducteurs","tag-wafer-fabs","domains-electronique-eci"],"acf":[],"yoast_head":"Canon en voie d'industrialiser NIL concurrent de EUV ...<\/title>\n<meta name=\"description\" content=\"Canon en voie d'industrialiser la lithographie nano-imprint NIL concurrent de EUV et capable de g\u00e9om\u00e9tries en dessous de 10 nm\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, 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