{"id":234028,"date":"2015-08-25T22:00:00","date_gmt":"2015-08-25T22:00:00","guid":{"rendered":"https:\/\/eenewseurope.artwhere.co\/nano-transistor-gan-la-tension-de-blocage-depasse-1-kv\/"},"modified":"2015-08-25T22:00:00","modified_gmt":"2015-08-25T22:00:00","slug":"nano-transistor-gan-la-tension-de-blocage-depasse-1-kv","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/nano-transistor-gan-la-tension-de-blocage-depasse-1-kv\/","title":{"rendered":"Nano transistor GaN : la tension de blocage d\u00e9passe 1 kV !"},"content":{"rendered":"<p>Afin d&rsquo;obtenir une faible r&eacute;sistance permettant de r&eacute;duire la consommation d&rsquo;&eacute;nergie et l&rsquo;&eacute;chauffement des composants, les chercheurs ont &eacute;t&eacute; conduits &agrave; &eacute;tudier les syst&egrave;mes GaN pour la nano&eacute;lectronique. Les premiers travaux ont port&eacute;s sur les transistors GaN et AlGaN &agrave; structure orient&eacute;e lat&eacute;ralement capables de fournir une r&eacute;activit&eacute; &eacute;lev&eacute;e et une faible r&eacute;sistance.<br \/>\nCependant, ce type de structure limite les niveaux de tension de seuil et de claquage qui peuvent &ecirc;tre obtenues avec des circuits faible encombrement. <\/p>\n<\/p>\n<p>D&eacute;sormais, Tohru Oka et son &eacute;quipe montrent comment ils peuvent surmonter ces limitations. Pour cela, ils ont adopt&eacute; une structure &agrave; orientation verticale. Les travaux ant&eacute;rieurs ont d&eacute;j&agrave; d&eacute;montr&eacute; que, dans cette orientation, la tension de claquage peut &ecirc;tre accrue en augmentant l&rsquo;&eacute;paisseur de r&eacute;gion d&rsquo;appauvrissement sans compromettre la taille de l&rsquo;unit&eacute;. Cependant, ces structures pr&eacute;sentent toujours une limitation de la tension de blocage pour que le dispositif puisse r&eacute;sister si une faible r&eacute;sistance ON est conserv&eacute;e.<\/p>\n<p> &quot;Nous avons repens&eacute; les &eacute;paisseurs et les concentrations de dopage des couches de canal et d&rsquo;appauvrissement afin de r&eacute;duire les r&eacute;sistances des couches &eacute;pitaxiales tout en maintenant une tension de blocage de plus de 1,2 kV,&quot; expliquent Oka et ses coll&egrave;gues dans leur rapport d&rsquo;&eacute;tude.<br \/>\nIls utilisent &eacute;galement des d&eacute;coupes de porte de forme hexagonale afin d&rsquo;augmenter la largeur de la porte par unit&eacute; de surface tout en r&eacute;duisant la r&eacute;sistance sp&eacute;cifique. &quot;Cela a conduit &agrave; l&rsquo;excellente performance du MOSFET GaN vertical de classe 1,2 kV avec une r&eacute;sistance sp&eacute;cifique de moins de 2 mOhms par cm2,&quot; concluent-ils.<\/p>\n<p><a title=\"jsap-bulletin.jsap.or.jp\/en\/\" href=\"http:\/\/eu.vocuspr.com\/Tracking.aspx?Data=HHL%3d8.47%3a2-%3eLCE5%3a130%3e%26SDG%3c%3a0%3c2&amp;RE=MC&amp;RI=3973982&amp;Preview=False&amp;DistributionActionID=109411&amp;Action=Follow+Link\" target=\"_blank\" rel=\"noopener\">jsap-bulletin.jsap.or.jp\/en\/<\/a><a title=\"dx.doi.org\/10.7567\/APEX.8.054101\" href=\"http:\/\/eu.vocuspr.com\/Tracking.aspx?Data=HHL%3d8.47%3a2-%3eLCE5%3a130%3e%26SDG%3c%3a0%3c2&amp;RE=MC&amp;RI=3973982&amp;Preview=False&amp;DistributionActionID=109412&amp;Action=Follow+Link\" target=\"_blank\" rel=\"noopener\"><br \/>\ndx.doi.org\/10.7567\/APEX.8.054101<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Diffus\u00e9es par Japan Society of Applied Physics (JSAP), les derni\u00e8res recherches rapport\u00e9es dans Applied Physics Express (APEX) par Tohru Oka et son \u00e9quipe de R&amp;D bas\u00e9e au si\u00e8ge de TOYODA GOSEI au Japon d\u00e9crivent le d\u00e9veloppement de transistors \u00e0 base de GaN et structure verticale offrant des tensions de blocage sup\u00e9rieures \u00e0 1kV. <\/p>\n","protected":false},"author":22,"featured_media":234029,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[],"tags":[],"domains":[47],"ppma_author":[1149],"class_list":["post-234028","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","domains-electronique-eci"],"acf":[],"yoast_head":"<title>Nano transistor GaN : la tension de blocage d\u00e9passe 1 kV ! 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