{"id":227162,"date":"2013-05-26T22:00:00","date_gmt":"2013-05-26T22:00:00","guid":{"rendered":"https:\/\/eenewseurope.artwhere.co\/premier-developpement-de-la-gravure-de-logique-flash-integree-en-45-nm\/"},"modified":"2013-05-26T22:00:00","modified_gmt":"2013-05-26T22:00:00","slug":"premier-developpement-de-la-gravure-de-logique-flash-integree-en-45-nm","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/premier-developpement-de-la-gravure-de-logique-flash-integree-en-45-nm\/","title":{"rendered":"Premier d\u00e9veloppement de la gravure de logique flash int\u00e9gr\u00e9e en 45 nm"},"content":{"rendered":"<p>&quot;La gravure de logique eFlash en 45 nm de Samsung peut &ecirc;tre largement adopt&eacute;e dans divers composants de solutions de s&eacute;curit&eacute; et d&rsquo;appareils mobiles, notamment les circuits pour cartes &agrave; puce, les puces NFC (communication en champ proche), les &eacute;l&eacute;ments de s&eacute;curit&eacute; int&eacute;gr&eacute;s (eSE) et TPM (module de plate-forme fiable)&quot;, a d&eacute;clar&eacute; Taehoon Kim, vice-pr&eacute;sident marketing, System LSI Business, Samsung Electronics. &quot;Les performances excellentes de ce circuit de test pour cartes &agrave; puce nous permettront de renforcer notre leadership sur le march&eacute; des puces de s&eacute;curit&eacute;&quot;.<br \/>\nLa technologie de gravure de logique eFlash en 45 nm de Samsung conf&egrave;re &agrave; ce composant pour cartes &agrave; puce une grande fiabilit&eacute; et uneendurance garantie d&rsquo;un million de cycles par cellule de m&eacute;moire flash. Ces performances sont les meilleures de sa cat&eacute;gorie. Elles surpassent toutes les autres solutions actuelles du march&eacute; qui n&rsquo;offrent g&eacute;n&eacute;ralement que 500 000 cycles.<br \/>\nGr&acirc;ce aux am&eacute;liorations apport&eacute;es &agrave; la structure et &agrave; la logique d&rsquo;utilisation des cellules flash, l&rsquo;acc&egrave;s al&eacute;atoire de lecture de m&eacute;moire propos&eacute; par la puce de test est 50% plus rapide et l&rsquo;efficacit&eacute; &eacute;nerg&eacute;tique est am&eacute;lior&eacute;e de 25% par rapport aux produits pr&eacute;c&eacute;dents bas&eacute;s sur la gravure de logique eFlash de 80 nm.<br \/>\nLa technologie de logique eFlash avanc&eacute;e de 45 nm de Samsung, fruit des synergies technologiques bas&eacute;es sur plusieurs dizaines d&rsquo;ann&eacute;es d&rsquo;exp&eacute;rience et de savoir-faire en m&eacute;moire flash int&eacute;gr&eacute;e et en gravures de logique, permettra &agrave; Samsung d&rsquo;assurer un bon niveau de comp&eacute;titivit&eacute; et d&rsquo;apporter davantage de valeur ajout&eacute;e &agrave; ses clientsfonderie\/ASIC du secteur microcontr&ocirc;leurs grand public ou puces pour l&rsquo;automobile, qui exigent davantage de vitesse, de capacit&eacute; m&eacute;moire et d&rsquo;efficacit&eacute; &eacute;nerg&eacute;tique. <br \/>\nLes premiers circuits pour cartes &agrave; puce bas&eacute;s sur la technologie de logique eFlash de 45 nm devraient &ecirc;tre commercialis&eacute;s d&egrave;s le deuxi&egrave;me semestre 2014. <\/p>\n<p><a title=\"www.samsung.com\" href=\"http:\/\/www.samsung.com\/\">www.samsung.com<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Samsung Electronics Co., Ltd. a annonc\u00e9\u00a0 le premier d\u00e9veloppement de la gravure de logique flash \u00a0int\u00e9gr\u00e9e (eFlash) en 45 nanom\u00e8tres. Samsung a incorpor\u00e9 avec\u00a0 succ\u00e8s la nouvelle technologie de gravure dans un circuit de test pour cartes \u00e0 puce. Cette technologie satisfait donc aux exigences de qualit\u00e9 draconiennes impos\u00e9es par le march\u00e9 des solutions de s\u00e9curit\u00e9  et peut \u00eatre commercialis\u00e9e avec succ\u00e8s.<\/p>\n","protected":false},"author":22,"featured_media":227163,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[],"tags":[],"domains":[47],"ppma_author":[1149],"class_list":["post-227162","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","domains-electronique-eci"],"acf":[],"yoast_head":"<title>Premier d\u00e9veloppement de la gravure de logique flash int\u00e9gr\u00e9...<\/title>\n<meta name=\"description\" content=\"Samsung Electronics Co., Ltd. a annonc\u00e9\u00a0 le premier d\u00e9veloppement de la gravure de logique flash \u00a0int\u00e9gr\u00e9e (eFlash) en 45 nanom\u00e8tres. Samsung a...\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/227162\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Premier d\u00e9veloppement de la gravure de logique flash int\u00e9gr\u00e9e en 45 nm\" \/>\n<meta property=\"og:description\" content=\"Samsung Electronics Co., Ltd. a annonc\u00e9\u00a0 le premier d\u00e9veloppement de la gravure de logique flash \u00a0int\u00e9gr\u00e9e (eFlash) en 45 nanom\u00e8tres. Samsung a incorpor\u00e9 avec\u00a0 succ\u00e8s la nouvelle technologie de gravure dans un circuit de test pour cartes \u00e0 puce. 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