{"id":222523,"date":"2011-09-25T22:00:00","date_gmt":"2011-09-25T22:00:00","guid":{"rendered":"https:\/\/eenewseurope.artwhere.co\/mentor-graphics-et-nuflare-technology-etendent-leur-collaboration\/"},"modified":"2011-09-25T22:00:00","modified_gmt":"2011-09-25T22:00:00","slug":"mentor-graphics-et-nuflare-technology-etendent-leur-collaboration","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/mentor-graphics-et-nuflare-technology-etendent-leur-collaboration\/","title":{"rendered":"Mentor Graphics et NuFlare Technology \u00e9tendent leur collaboration"},"content":{"rendered":"

Le nouvel accord couvre les produits Mentor Graphics Calibre FRACTUREt, Calibre FRACTUREv, Calibre MDPmerge, Calibre MDPverify, Calibre nmMPC et Calibre MDPview. Ceux-ci sont utilisés avec les scripteurs de masque NuFlare avec la série EBM-3000 jusqu’à la série EBM-8000, et sont en cours d’extension aux machines de future génération pour réaliser la préparation des données, la correction de process et la vérification des données de masque afin d’améliorer la fidélité de la forme du masque final. NuFlare utilisera également les outils Mentor pour étudier les innovations pendant la recherche et développement, pour vérifier les nouvelles caractéristiques produits et pour aider dans le support client. Les derniers efforts de Mentor et NuFlare ont abouti à la définition d’une interface d’entrée OASIS.MASK et à la définition d’extensions de format pour réaliser les annotations de dose pour l’écriture de masques avancés dans des outils de nouvelle génération. <\/p>\n

www.mentor.com\/<\/a> <\/p>\n","protected":false},"excerpt":{"rendered":"

Mentor Graphics et NuFlare Technology \u00a0annoncent l’extension de leur collaboration \u00e0 des solutions logiciel et mat\u00e9riel int\u00e9gr\u00e9es pour la g\u00e9n\u00e9ration de masques de circuits int\u00e9gr\u00e9s avanc\u00e9s. Le nouvel accord de marketing et de support commun aidera \u00e0 assurer des interfaces int\u00e9gr\u00e9es, une haute fid\u00e9lit\u00e9 des masques, des temps d’\u00e9criture de masques rapides et de tr\u00e8s hauts niveaux de support technique.<\/p>\n","protected":false},"author":22,"featured_media":222524,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[],"tags":[],"domains":[47],"ppma_author":[1149],"class_list":["post-222523","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","domains-electronique-eci"],"acf":[],"yoast_head":"Mentor Graphics et NuFlare Technology \u00e9tendent leur collaborat...<\/title>\n<meta name=\"description\" content=\"Mentor Graphics et NuFlare Technology \u00a0annoncent l'extension de leur collaboration \u00e0 des solutions logiciel et mat\u00e9riel int\u00e9gr\u00e9es pour la g\u00e9n\u00e9ration...\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.ecinews.fr\/fr\/wp-json\/wp\/v2\/posts\/222523\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Mentor Graphics et NuFlare Technology \u00e9tendent leur collaboration\" \/>\n<meta property=\"og:description\" content=\"Mentor Graphics et NuFlare Technology \u00a0annoncent l'extension de leur collaboration \u00e0 des solutions logiciel et mat\u00e9riel int\u00e9gr\u00e9es pour la g\u00e9n\u00e9ration de masques de circuits int\u00e9gr\u00e9s avanc\u00e9s. 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