{"id":104978,"date":"2018-10-30T23:31:44","date_gmt":"2018-10-30T23:31:44","guid":{"rendered":"https:\/\/\/lithographie-samsung-electronics-lance-la-production-en-7-nm\/"},"modified":"2018-10-30T23:31:44","modified_gmt":"2018-10-30T23:31:44","slug":"lithographie-samsung-electronics-lance-la-production-en-7-nm","status":"publish","type":"post","link":"https:\/\/www.ecinews.fr\/fr\/lithographie-samsung-electronics-lance-la-production-en-7-nm\/","title":{"rendered":"Lithographie : Samsung Electronics lance la production en 7 nm"},"content":{"rendered":"

Le lancement de la 7LPP offre des perspectives claires vers le 3 nm. \u00ab Avec l\u2019introduction d’un n\u0153ud de gravure par rayonnement ultraviolet extr\u00eame (EUV), Samsung a men\u00e9 une r\u00e9volution discr\u00e8te dans l\u2019industrie des semi-conducteurs \u00bb, a d\u00e9clar\u00e9 Charlie Bae, vice-pr\u00e9sident directeur de l\u2019\u00e9quipe Vente et marketing fonderie chez Samsung Electronics. \u00ab Avec ce changement fondamental dans la fabrication des wafers, nos clients am\u00e9liorent consid\u00e9rablement le d\u00e9lai de lancement de leurs produits avec une capacit\u00e9 de production sup\u00e9rieure, moins de couches et de meilleurs r\u00e9sultats. Nous sommes convaincus que le 7LPP constitue un choix optimal non seulement pour les applications mobiles et de calcul haute performance, mais \u00e9galement pour un large \u00e9ventail d\u2019applications de pointe \u00bb.<\/p>\n

Caract\u00e9ristiques et avantages de la technologie EUV<\/strong><\/p>\n

L\u2019EUV utilise une lumi\u00e8re d\u2019une longueur d’onde de 13,5 nm pour exposer les galettes de silicium, par opposition aux technologies classiques \u00e0 immersion \u00e0 laser \u00e0 fluorure d’argon (ArF) qui ne peuvent atteindre que des longueurs d’onde de 193 nm et n\u00e9cessitent de co\u00fbteux jeux de masques d\u2019impression multiple. L\u2019EUV permet d’utiliser un seul masque pour cr\u00e9er une couche sur une galette de silicium quand l\u2019ArF peut exiger jusqu’\u00e0 4 masques pour cr\u00e9er la m\u00eame couche. La gravure 7LPP de Samsung peut donc r\u00e9duire de pr\u00e8s de 20 % le nombre total de masques requis par la gravure sans EUV, ce qui permet aux clients de faire des \u00e9conomies de temps et d\u2019argent.<\/p>\n

Les am\u00e9liorations de la lithographie EUV offrent \u00e9galement des performances accrues, une consommation inf\u00e9rieure et une surface r\u00e9duite, tout en am\u00e9liorant la productivit\u00e9 de la conception gr\u00e2ce \u00e0 la r\u00e9duction de la complexit\u00e9 des masques d\u2019impression multiple. Par rapport aux technologies FinFET en 10 nm pr\u00e9c\u00e9dentes, la technologie 7LPP de Samsung ne se limite pas \u00e0 une r\u00e9duction sensible de la complexit\u00e9 de la gravure. Avec moins de couches et de meilleurs r\u00e9sultats, elle offre \u00e9galement une augmentation de 40 % du rendement de surface avec des performances sup\u00e9rieures de 20 % ou une consommation inf\u00e9rieure de 50 %.<\/p>\n

La voie de la technologie EUV <\/strong><\/p>\n

Samsung a, depuis ses d\u00e9buts en recherche et d\u00e9veloppement de l\u2019EUV dans les ann\u00e9es 2000, r\u00e9alis\u00e9 des progr\u00e8s remarquables en collaborant en partenariat avec des fournisseurs d\u2019outils de premier plan. La soci\u00e9t\u00e9 a ainsi pu concevoir et installer de tout nouveaux \u00e9quipements dans ses sites de production et assurer la stabilit\u00e9 des wafers grav\u00e9s en EUV. Samsung a lanc\u00e9 la production en EUV dans son usine S3 \u00e0 Hwaseong, en Cor\u00e9e.<\/p>\n

D’ici 2020, Samsung pr\u00e9voit d\u2019assurer une capacit\u00e9 suppl\u00e9mentaire avec la nouvelle ligne EUV pour les clients ayant besoin de fabriquer leurs conceptions de puces de nouvelle g\u00e9n\u00e9ration en grande s\u00e9rie. En tant que pionnier de l\u2019EUV, Samsung a \u00e9galement d\u00e9velopp\u00e9 des fonctionnalit\u00e9s exclusives, telles qu’un outil unique d’inspection des masques. Ce dernier d\u00e9tecte rapidement les d\u00e9fauts des masques EUV, ce qui permet ainsi de les \u00e9liminer au d\u00e9but du cycle de fabrication.<\/p>\n

www.samsungfoundry.com<\/a>\u202f\u202f<\/p>\n

 <\/h3>\n

Un passage massif aux disques SSD pour le grand public ?<\/a><\/h3>\n

Exynos et ISOCELL: de nouvelles marques Samsung pour des solutions de classe automobile<\/a><\/h3>\n

Collaboration Samsung Foundry et Arm Expand<\/a><\/h3>\n

Samsung Electronics lance la construction de sa nouvelle ligne EUV \u00e0 Hwaseong<\/a><\/h3>\n","protected":false},"excerpt":{"rendered":"

Samsung Electronics Co., Ltd. a achev\u00e9 toutes les \u00e9tapes du d\u00e9veloppement de la technologie de gravure et lanc\u00e9 la production des wafers de son n\u0153ud de gravure r\u00e9volutionnaire 7LPP (7 nm Low Power Plus) avec la technologie de lithographie par rayonnement ultraviolet extr\u00eame .<\/p>\n","protected":false},"author":9,"featured_media":104979,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[],"tags":[],"domains":[47],"ppma_author":[1141],"class_list":["post-104978","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","domains-electronique-eci"],"acf":[],"yoast_head":"Lithographie : Samsung Electronics lance la production en 7 nm ...<\/title>\n<meta name=\"description\" content=\"Samsung Electronics Co., Ltd. a achev\u00e9 toutes les \u00e9tapes du d\u00e9veloppement de la technologie de gravure et lanc\u00e9 la 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